The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2019

Filed:

Oct. 25, 2018
Applicant:

United Microelectronics Corp., Hsin-Chu, TW;

Inventors:

Ai-Sen Liu, Hsinchu, TW;

Bin-Siang Tsai, Changhua County, TW;

Chin-Fu Lin, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 16/04 (2006.01); G11C 13/02 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
G11C 13/025 (2013.01); H01L 27/0251 (2013.01);
Abstract

A non-volatile memory includes a back gate, a first graphene ribbon layer, a dielectric layer, a second graphene ribbon layer and a porous dielectric layer. The back gate is disposed in a substrate. The first graphene ribbon layer is disposed on the substrate. The dielectric layer covers the first graphene ribbon layer but exposes an exposed part of the first graphene ribbon layer. The second graphene ribbon layer including two end parts connected by a cantilever part is disposed above the first graphene ribbon layer, and the cantilever part is right above the exposed part of the first graphene ribbon layer. The porous dielectric layer is disposed on the dielectric layer and seals the cantilever part. The present invention also provides a method of forming said non-volatile memory.


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