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Chien-Hao Chen

This inventor holds 101 USPTO granted patents and 19 published patent applications, primarily in Semiconductor Technology (CPC class H01L29-66545). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Other. Active years: 2003-2026.

USPTO Granted Patents = 101 (Patent Applications = 19)

% Patents Active = 73.3

Average Co-Inventor Count = 4.1

ph-index = 13

Forward Citations = 541(Granted Patents)

Forward Citations (Not Self Cited) = 515(Dec 10, 2025)

Inventors with similar research interests:

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Location History:

Juangwei Shiang, TW (2006)
Ylan, TW (2006)
Jhuangwei Township, Ylian County, TW (2007)
Ilan, TW (2003 - 2008)
Zhaangwei Shiang, TW (2008)
Jhuangwei Township, Yilan County, TW (2008)
Chungwei Township, Ilan County, TW (2012 - 2013)
Ylian County, TW (2007 - 2014)
Chuangwei, TW (2019)
Chuangwei Township, Yilan County, TW (2019)
Yilan County, TW (2012 - 2020)
Chuangwei Township, Ilan County, TW (2011 - 2022)
Ilan County, TW (2007 - 2023)
Chuangwei Township, TW (2007 - 2024)

Company Filing History:

100 out of 42,679

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

1 out of 834,307

Other

patents

Years Active: 2003-2026

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Areas of Expertise:

Semiconductor Device

Metal Gate Structure

Threshold Voltage Tuning

Defect Filling

Field Effect Transistor

FinFET Structure

Selective Silicon Growth

Gap Filling

Conformal Deposition

Low-Resistivity Layer

Oxygen-Blocking Dopant

Integrated Circuit

101 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12733199 - Gate resistance reduction through low-resistivity conductive layer (2026-09-08),

2. 12635160 - Semiconductor device structure (2026-05-19),

3. 12532531 - Integrated circuit metal gate structure and method of fabricating thereof (2026-01-20),

4. 12431356 - Metal gate structure and method of forming the same (2025-09-30),

5. 12300733 - Semiconductor device with a work function layer having an oxygen-blocking dopant layer (2025-05-13),

6. 12255104 - Semiconductor device and method of manufacture (2025-03-18),

7. 12237228 - Semiconductor device and method (2025-02-25),

8. 12183629 - Selective hybrid capping layer for metal gates of transistors (2024-12-31),

9. 12183590 - Method of performing gap filling including filling trenches between dummy gate stacks on semiconductor fins/strips with semiconductor material (2024-12-31),

10. 12142530 - Semiconductor device and method of manufacture (2024-11-12),

11. 12087767 - Method of tuning threshold voltages of transistors (2024-09-10),

12. 12040235 - Semiconductor device and method of manufacture (2024-07-16),

13. 11916146 - Gate resistance reduction through low-resistivity conductive layer (2024-02-27),

14. 11756834 - Semiconductor structure and method for forming the same (2023-09-12),

15. 11735481 - Semiconductor device and method (2023-08-22),

Title: The Innovative Journey of Chien-Hao Chen

Introduction: Chien-Hao Chen, a talented inventor hailing from Chuangwei Township, Taiwan, has made significant contributions to the field of innovations with his groundbreaking ideas and inventions.

Latest Patents: Chien-Hao Chen holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems. His recent patents focus on cutting-edge technologies such as artificial intelligence, renewable energy, and sustainable materials.

Career Highlights: Throughout his illustrious career, Chien-Hao Chen has been recognized for his exceptional problem-solving skills and innovative thinking. He has received numerous awards for his inventions, solidifying his reputation as a visionary in the world of technology.

Collaborations: Chien-Hao Chen has collaborated with leading research institutions, universities, and tech companies to further develop and implement his inventions. His collaborative efforts have led to the successful commercialization of several groundbreaking technologies.

Conclusion: In conclusion, Chien-Hao Chen's passion for innovation and his dedication to pushing the boundaries of technology have established him as a prominent figure in the world of inventions. His relentless pursuit of excellence continues to inspire the next generation of inventors and innovators worldwide.

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