This inventor holds 20 USPTO granted patents and 5 published patent applications. Top assignees: International Business Machines Corporation, Globalfoundries Inc., Infineon Technologies Ag. Active years: 2002-2019.
Location History:
- Fishkill, NY (US) (2002 - 2003)
- Wappingers Falls, NY (US) (2004 - 2007)
- Hopewell Junction, NY (US) (2004 - 2015)
- Ridgefield, CT (US) (2015 - 2019)
Company Filing History:
18 out of 166,264 
3 out of 5,671 
2 out of 15,016 
Years Active: 2002-2019
Title: The Inventive Mind of Brett H Engel
Introduction:
Brett H Engel, a prolific inventor hailing from Hopewell Junction, NY (US), has made significant contributions in the field of diffusion barrier layer formation through his numerous patented innovations.
Latest Patents:
Engel's latest patents revolve around a method for forming a titanium nitride (TiN) diffusion barrier. This method involves a precise sequence of exposing a deposition surface to titanium-containing precursors and nitrogen-rich plasma pulses to create distinct layers with varying nitrogen concentrations, effectively preventing fluorine diffusion.
Career Highlights:
With an impressive portfolio of 20 patents to his name, Brett H Engel has showcased his expertise in the intricate realm of diffusion barrier technology. He has garnered recognition for his groundbreaking methods that play a crucial role in enhancing the functionality and reliability of electronic devices.
Collaborations:
Throughout his career, Brett H Engel has collaborated with esteemed companies such as IBM (International Business Machines Corporation) and Globalfoundries Inc. His partnerships with coworkers like Vincent James McGahay and Domingo A Ferrer have further enriched his innovative pursuits, fostering a dynamic environment for shared knowledge and expertise.
Conclusion:
In conclusion, Brett H Engel stands as a shining example of ingenuity and dedication in the realm of patent innovation. His groundbreaking work in diffusion barrier layer formation serves as a testament to his unwavering commitment to pushing the boundaries of technological advancement.