The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 29, 2015

Filed:

Jul. 31, 2014
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Patrick W. DeHaven, Poughkeepsie, NY (US);

Brett H. Engel, Ridgefield, CT (US);

Domingo A. Ferrer, Fishkill, NY (US);

Arun Vijayakumar, Poughkeepsie, NY (US);

Keith Kwong Hon Wong, Wappingers Falls, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 23/48 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 23/481 (2013.01); H01L 21/7685 (2013.01); H01L 21/76841 (2013.01); H01L 21/76846 (2013.01); H01L 21/76879 (2013.01);
Abstract

A method includes forming a first metal liner conformally along a sidewall and a bottom of a contact opening. A second metal liner is formed above and in direct contact with the first metal liner, a grain size of the first metal liner is larger than a grain size of the second metal liner. A barrier layer is formed above and in direct contact with the second metal liner and the contact opening is filled with a conductive material to form a middle-of-the-line contact.


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