Inventors with similar research interests:
Location History:
- Wappinger Falls, NY (US) (2008 - 2013)
- Hopewell Junction, NY (US) (2010 - 2015)
- New York, NY (US) (2015 - 2016)
- Wappingers Fall, NY (US) (2015 - 2019)
- Wappingers Falls, NY (US) (2002 - 2021)
Company Filing History:
Years Active: 2002-2021
Title: Keith Kwong Hon Wong: Pioneering Innovations in Electrical Engineering
Introduction:
Keith Kwong Hon Wong, an esteemed inventor and electrical engineer, has made significant contributions to the field of electrical engineering. With a remarkable number of 206 patents to his name, Wong's inventive prowess and dedication to innovation have propelled him to the forefront of the industry. This article explores some of his latest patents, career highlights, and collaborations that have shaped his illustrious journey.
Latest Patents:
Among Keith Kwong Hon Wong's recent patents, two inventions stand out for their potential to revolutionize electrical devices and manufacturing processes.
1. Electrical fuse with metal line migration:
Wong's invention of an electrical fuse with metal line migration offers improved circuit protection. The fuse device employs a metal line that connects two contacts, with each contact having different electromigration resistances. The metal line, designed with a lower electromigration resistance, allows a programming current to flow from one contact to the other. As the current passes through the metal line, it causes the line to move away from the second contact, effectively isolating circuit elements. This innovation ensures enhanced safety and reliability within electrical systems for various applications.
2. Mechanically stable cobalt contacts:
Another pioneering invention by Wong includes the development of cobalt contacts with a dual silicide barrier layer. Traditionally, challenges in metal annealing have led to void formation when connecting cobalt contacts to conductive device regions. Wong's innovation addresses this issue by incorporating a dual silicide barrier layer consisting of cobalt and titanium silicides. This barrier layer improves the adhesion between cobalt contacts and semiconductor device regions, eliminating void formation and enhancing the overall mechanical stability of electronic components.
Career Highlights:
Keith Kwong Hon Wong has amassed an impressive portfolio of patents throughout his career, illustrating his expertise and ingenuity in electrical engineering. Working with renowned companies such as IBM (International Business Machines Corporation) and Globalfoundries Inc., Wong has made significant contributions to their research and development efforts. His inventions and solutions have played a vital role in advancing the capabilities of electrical devices, improving their performance, and increasing their reliability.
Collaborations:
Wong's collaborations with esteemed colleagues have been instrumental in his innovative journey. Notably, he has worked alongside Chih-Chao Yang and Dechao Guo, esteemed professionals in their respective fields. Through their collaborative efforts, Wong and his colleagues have collectively contributed to advancements in various electrical engineering technologies, fostering a culture of innovation and driving the industry forward.
Conclusion:
Keith Kwong Hon Wong's relentless pursuit of innovation and his numerous patents demonstrate his immense contributions to the field of electrical engineering. From groundbreaking inventions in circuit protection to designing robust cobalt contacts, Wong has left an indelible mark on the industry. His career, highlighted by collaborations with esteemed colleagues, further exemplifies his dedication to pushing the boundaries of electrical engineering. As the field continues to evolve, Keith Kwong Hon Wong's innovations will undoubtedly inspire future generations of inventors and engineers in their quest for technological advancement.
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