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For the Inventor, By the Inventor

Suwon-si, South Korea

Boo-deuk Kim

USPTO Granted Patents = 12 

Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 9(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2007 - 2014)
  • Suwon-si, KR (2006 - 2019)

Company Filing History:

goldMedal12 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2006-2019

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12 patents (USPTO):Explore Patents
1. 10236185 - Method of forming patterns for semiconductor device (2019-03-19),
2. 9899231 - Hard mask composition for spin-coating (2018-02-20),
3. 8871423 - Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same (2014-10-28),
4. 8685865 - Method of forming patterns of semiconductor device (2014-04-01),
5. 7964332 - Methods of forming a pattern of a semiconductor device (2011-06-21),
6. 7638388 - Method of forming a pattern and method of manufacturing a capacitor using the same (2009-12-29),
7. 7485407 - Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist composition (2009-02-03),
8. 7442489 - Photoresist composition and method of forming a photoresist pattern using the same (2008-10-28),
9. 7282319 - Photoresist composition and method of forming a pattern using same (2007-10-16),
10. 7053030 - Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the same (2006-05-30),
11. 7026497 - Adhesive compound and method for forming photoresist pattern using the same (2006-04-11),
12. 7026240 - Method of fabricating a semiconductor device having a photo-sensitive polyimide layer and a device fabricated in accordance with the method (2006-04-11),

Title: The Innovative Contributions of Boo-deuk Kim

Introduction

Boo-deuk Kim is a prominent inventor based in Suwon-si, South Korea, with a remarkable portfolio of 12 patents to his name. His work primarily focuses on advancements in semiconductor device technologies, contributing significantly to the field of electronics.

Latest Patents

Among his latest innovations is a patent titled "Method of forming patterns for semiconductor device." This method involves the preparation of a hardmask composition that includes a carbon allotrope and a specific spin-on hardmask material. The process detailed in the patent emphasizes the formation of photoresist patterns, hardmask patterns, and etched patterns, showcasing a cutting-edge approach to semiconductor fabrication.

Additionally, Boo-deuk Kim is credited with a patent for a "Hard mask composition for spin-coating." This composition comprises a graphene copolymer and a solvent, providing enhanced etching resistance, which allows for the etching of masks with smaller thicknesses and increased aspect ratios.

Career Highlights

Boo-deuk Kim currently works at Samsung Electronics Co., Ltd., where he has leveraged his expertise to drive forward innovation in semiconductor technology. His commitment to research and development has placed him at the forefront of his industry, making notable contributions through his patented technologies.

Collaborations

Throughout his career, Boo-deuk Kim has collaborated with talented individuals such as Young-ho Kim and Kyoung-mi Kim. These partnerships have fostered a creative environment and have led to successful outcomes in their joint projects, enhancing the innovation landscape within their organization.

Conclusion

In conclusion, Boo-deuk Kim stands out as a key inventor in the realm of semiconductor device technologies. His patents not only reflect his innovative spirit but also contribute to advancements that propel the electronics industry forward. With his ongoing contributions, he continues to shape the future of technology at Samsung Electronics Co., Ltd.

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