The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2007
Filed:
May. 31, 2005
Kyoung-mi Kim, Gyeonggi-do, KR;
Yeu-young Youn, Seoul, KR;
Youn-kyung Wang, Gyeonggi-do, KR;
Jae-ho Kim, Gyeonggi-do, KR;
Young-ho Kim, Gyeonggi-do, KR;
Boo-deuk Kim, Gyeonggi-do, KR;
Kyoung-Mi Kim, Gyeonggi-do, KR;
Yeu-Young Youn, Seoul, KR;
Youn-Kyung Wang, Gyeonggi-do, KR;
Jae-Ho Kim, Gyeonggi-do, KR;
Young-Ho Kim, Gyeonggi-do, KR;
Boo-Deuk Kim, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by weight of a polymer resin, the PAG including a monophenyl sulfonium compound, a triphenyl sulfonium compound or a mixture thereof. The footing phenomenon and the top loss of a pattern are sufficiently prevented.