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For the Inventor, By the Inventor

Anyang, South Korea

Kyoung-mi Kim

This inventor holds 21 USPTO granted patents and 4 published patent applications, primarily in Semiconductor Manufacturing. Top assignees: Samsung Electronics Co., Ltd., Korea Advanced Institute of Science and Technology. Active years: 2006-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyoung-mi Kim. Retrieved from https://idiyas.com/inventor/kyoung-mi-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 38.1

Average Co-Inventor Count = 4.8

ph-index = 4

Forward Citations = 43(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2006 - 2014)
  • Anyang-si, KR (2006 - 2019)

Company Filing History:

goldMedal21 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal1 out of 2,790 
 
Korea Advanced Institute of Science and Technology
 patents
where one patent can have more than one assignee

Years Active: 2006-2019

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Areas of Expertise:
Photoresist Composition
Siloxane Polymer
Pattern Formation
Photolithography
Semiconductor Devices
Thinner Composition
Cyclic Compound
Self-Aligned Double Patterning
Negative-Type Photoresist
Capacitor Manufacturing
Photosensitive Resin
Silicone Hyper-Branched Polymer
21 patents (USPTO):Explore Patents
1. 10437145 - Method of detaching a pellicle from a photomask (2019-10-08),
2. 9880462 - Pellicle and exposure mask including the same (2018-01-30),
3. 9437452 - Method of forming a fine pattern by using block copolymers (2016-09-06),
4. 8685865 - Method of forming patterns of semiconductor device (2014-04-01),
5. 8551689 - Methods of manufacturing semiconductor devices using photolithography (2013-10-08),
6. 8450444 - Siloxane polymer composition (2013-05-28),
7. 8377626 - Methods of forming a pattern using negative-type photoresist compositions (2013-02-19),
8. 8071484 - Method of forming fine pattern employing self-aligned double patterning (2011-12-06),
9. 7985347 - Methods of forming a pattern and methods of manufacturing a capacitor using the same (2011-07-26),
10. 7863231 - Thinner composition and method of removing photoresist using the same (2011-01-04),
11. 7776730 - Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same (2010-08-17),
12. 7736527 - Siloxane polymer compositions and methods of manufacturing a capacitor using the same (2010-06-15),
13. 7670748 - Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same (2010-03-02),
14. 7442489 - Photoresist composition and method of forming a photoresist pattern using the same (2008-10-28),
15. 7419759 - Photoresist composition and method of forming a pattern using the same (2008-09-02),

Title: The Innovative Mind of Kyoung-mi Kim

Introduction: Kyoung-mi Kim is a visionary inventor hailing from Anyang-si, South Korea. His groundbreaking work in the field of inventions has left a lasting impact on the industry.

Latest Patents: Kyoung-mi Kim holds several patents in various technological fields, showcasing his versatility and creativity in innovation.

Career Highlights: Throughout his illustrious career, Kyoung-mi Kim has consistently pushed the boundaries of what is possible, with a keen focus on developing solutions that improve the lives of people around the world.

Collaborations: Kyoung-mi Kim has collaborated with leading research institutions, universities, and companies to bring his inventions to life, demonstrating his ability to work effectively in multidisciplinary teams.

Conclusion: Kyoung-mi Kim stands as a testament to the power of innovation and the impact that one individual can have on the world through their dedication to pushing the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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