The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Jan. 17, 2006
Boo-deuk Kim, Gyeonggi-do, KR;
Jin-a Ryu, Seoul, KR;
Jae-ho Kim, Gyeonggi-do, KR;
Young-ho Kim, Gyeonggi-do, KR;
Kyoung-mi Kim, Gyeonggi-do, KR;
Boo-Deuk Kim, Gyeonggi-do, KR;
Jin-A Ryu, Seoul, KR;
Jae-Ho Kim, Gyeonggi-do, KR;
Young-Ho Kim, Gyeonggi-do, KR;
Kyoung-Mi Kim, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
In a photoresist composition for a semiconductor manufacturing process and a method of forming a photoresist pattern using the photoresist composition, the photoresist composition includes an organic dispersing agent for dispersing acid (H+). The photoresist film may have enough spaces among photosensitive polymers so that acid may be dispersed sufficiently in an exposure process. Thus, a photoresist pattern may be easily formed in a defocus region. Defects in a semiconductor device may be reduced and a productivity of the semiconductor manufacturing process may be enhanced.