The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2011
Filed:
Dec. 19, 2008
Hyo-jin Yun, Anyang-si, KR;
Young-ho Kim, Yongin-si, KR;
Boo-deuk Kim, Suwon-si, KR;
Ji-man Park, Osan-si, KR;
Jin-a Ryu, Hwaseong-si, KR;
Jae-hee Choi, Bucheon-si, KR;
Hyo-Jin Yun, Anyang-si, KR;
Young-Ho Kim, Yongin-si, KR;
Boo-Deuk Kim, Suwon-si, KR;
Ji-Man Park, Osan-si, KR;
Jin-A Ryu, Hwaseong-si, KR;
Jae-Hee Choi, Bucheon-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
In polymers for an anti-reflective coating, compositions for an anti-reflective coating and methods of forming a pattern of a semiconductor device using the same, the compositions for an anti-reflective coating include a polymer that includes a first repeating unit having a basic side group, a second repeating unit having a light-absorbing group, and a third repeating unit having a cross-linkable group; a photoacid generator; a cross-linking agent; and a solvent. The polymer for the anti-reflective coating, which may have a basic side group chemically bound to a backbone of the polymer, may properly adjust diffusion of an acid in an anti-reflective coating layer to improve the profile of a pattern.