The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2018
Filed:
Jan. 15, 2016
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Jung-hoon Kim, Hwaseong-si, KR;
Nae-ry Yu, Suwon-si, KR;
Boo-deuk Kim, Suwon-si, KR;
Song-se Yi, Seoul, KR;
Jung-sik Choi, Seongnam-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); H01L 21/311 (2006.01); G03F 7/40 (2006.01); H01L 21/02 (2006.01); H01L 21/033 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); G03F 7/40 (2013.01); H01L 21/02115 (2013.01); H01L 21/02282 (2013.01); H01L 21/0332 (2013.01); G03F 7/11 (2013.01);
Abstract
Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased aspect ratio may also be performed on a mask having a smaller thickness.