Nae-ry Yu

Title: Nae-ry Yu: Innovator in Hard Mask Composition and Film Formation

Introduction

Nae-ry Yu is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the development of hard mask compositions and methods for forming hardmask material films. With a total of 3 patents, his work has implications for various applications in semiconductor manufacturing.

Latest Patents

One of Nae-ry Yu's latest patents is a hard mask composition for spin-coating. This composition includes a graphene copolymer and a solvent, which enhances etching resistance. This innovation allows for etching with an increased aspect ratio on masks that have a smaller thickness. Another significant patent involves methods of forming hardmask material films. These methods include preparing a substrate with varying pattern densities, forming a hardmask material film, and performing heat treatment to alter solvent solubility. This process ensures that portions of the hardmask material film remain intact in the gaps between patterns, facilitating the formation of a second hardmask material film.

Career Highlights

Nae-ry Yu has worked with prominent companies such as Samsung Electronics Co., Ltd. and Samsung SDI Co., Inc. His experience in these leading organizations has contributed to his expertise in the field of materials science and semiconductor technology.

Collaborations

Throughout his career, Nae-ry Yu has collaborated with talented individuals, including Jung-hoon Kim and Song-se Yi. These collaborations have likely enriched his research and development efforts, leading to innovative solutions in his area of expertise.

Conclusion

Nae-ry Yu's contributions to hard mask compositions and film formation methods highlight his role as an influential inventor in the semiconductor industry. His patents reflect a commitment to advancing technology and improving manufacturing processes.