Samsung Electronics Co., Ltd.

Samsung Sdi Co., Inc.

Nae-ry Yu

Jung-hoon Kim

Song-se Yi

Chang-Ho Lee

Min-Soo Kim

Jae-Ho Kim

Dong-Won Kim

Hyun-woo Kim

Jung-sik Choi

Pil-Kwon Jun

Jung-Dae Park

Boo-deuk Kim

Jin-A Ryu

Myeong-koo Kim

Hyun-ji Song

Won-ki Lee

Jae-yeol Baek

Provided is a hard mask composition for spin-coating, and more particularly, a hard mask composition including a graphene copolymer and a solvent for spin-coating. The hard mask composition according to an exemplary embodiment has an improved etching resistance, and thus, etching with an increased aspect ratio may also be performed on a mask having a smaller thickness.

Hard mask composition for spin-coating

Methods of forming a hardmask material film are provided. The methods may include preparing a substrate including a first region that includes first patterns with a first density and a second region that includes second patterns with a second density that is lower than the first density or is free of patterns, forming a first hardmask material film in gaps between the first patterns and on surfaces of the first region and the second region, performing a heat treatment on the first hardmask material film such that solvent solubility of portions of the first hardmask material film in the gaps between the first patterns becomes different from solvent solubility of portions of the first hardmask material film outside the gaps, removing the first hardmask material film formed on the surfaces of the first region and the second region such that the portions of the first hardmask material film in the gaps at least partially remain in the gaps, and forming a second hardmask material film on the surfaces of the first region and the second region.

Methods of forming hardmask material film

In a method of detecting inhomogeneity of a layer, an incident light may be irradiated to at least two regions of the layer at a first incident angle position. First reflected lights reflected from the two regions of the layer may be sensed. The incident light may be irradiated to the at least two regions of the layer at a second incident angle position. Second reflected lights reflected from the two regions of the layer may be sensed. The first reflected lights and the second reflected lights may be compared with each other to obtain the inhomogeneity of the layer. Thus, the layer having a spot may be found.

Methods of detecting inhomogeneity of a layer and apparatus for performing the same

Growing community of inventors

Suwon-si, South Korea

Nae-ry Yu