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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8871423 B1

PDFFull Text
Date of Patent:
Oct. 28, 2014

Filed:

Jan. 28, 2011

Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same

Applicants:

Hyo-jin Yun, Suwon-si, KR;

Jae-ho Kim, Yongin-si, KR;

Young-ho Kim, Yongin-si, KR;

Boo-deuk Kim, Suwon-si, KR;

Jin-a Ryu, Hwaseong-si, KR;

Myung-sun Kim, Seoul, KR;

Se-kyung Baek, Hwaseong-si, KR;

Soo-kyung Kim, Suwon-si, KR;

Ji-yun Ham, Seongnam-si, KR;

Inventors:

Hyo-Jin Yun, Suwon-si, KR;

Jae-Ho Kim, Yongin-si, KR;

Young-Ho Kim, Yongin-si, KR;

Boo-Deuk Kim, Suwon-si, KR;

Jin-A Ryu, Hwaseong-si, KR;

Myung-Sun Kim, Seoul, KR;

Se-Kyung Baek, Hwaseong-si, KR;

Soo-Kyung Kim, Suwon-si, KR;

Ji-Yun Ham, Seongnam-si, KR;

Assignee:

Samsung Electronics Co., Ltd., , KR;

Attorney:

Myers Bigel Sibley & Sajovec, P.A.

Primary Examiner:

John Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/38 (2006.01); C07C 303/32 (2006.01); C07C 309/06 (2006.01); C07C 309/12 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/004 (2013.01); C07C 303/32 (2013.01); G03F 7/0045 (2013.01); C07C 309/12 (2013.01); G03F 7/0397 (2013.01); G03F 7/20 (2013.01); C07C 309/06 (2013.01); Y10S 430/122 (2013.01); Y10S 430/123 (2013.01);
Abstract

A photoresist composition for fabricating a probe array is provided. The photoresist composition includes a photoacid generator having an onium salt and an i-line reactive sensitizer.

Find Patent Forward Citations

Yun, Hyo-Jin. (2014). Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same (U.S. Patent No. 8871423). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8871423

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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