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Benjamin Szu-Min Lin

This inventor holds 49 USPTO granted patents, primarily in Photolithography Techniques. Top assignees: United Microelectronics Corp., Infineon Technologies Ag, Winbond Electronics Corporation. Active years: 1998-2012.

USPTO Granted Patents = 49

% Patents Active = 91.8

Average Co-Inventor Count = 1.4

ph-index = 9

Forward Citations = 242(Granted Patents)

Location History:

Tung Chui Chiayi, TW (1999)
Chia-I, TW (1999)
Chia-Yi, TW (1998 - 2000)
Chiayi City, TW (2000)
Hsin-Chu City, TW (2001)
Tai-Nan, TW (2009)
Hsinchu, TW (2001 - 2012)

Company Filing History:

39 out of 7,260

United Microelectronics Corp.

patents

4 out of 15,016

Infineon Technologies Ag

patents

4 out of 2,106

Winbond Electronics Corporation

patents

4. 2 out of 4

United Microelectronics Co.

patents

5. 2 out of 834,411

Other

patents

where one patent can have more than one assignee

Years Active: 1998-2012

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Areas of Expertise:

Photomask

EUV Reflection Mask

Phase Shifting

Immersion Lithography

Critical Dimension

Semiconductor Fabrication

Alignment Marks

Double-Sided Photomask

Nested Contacts

Vertical MOS Transistor

Self-Aligned Polysilicon

Dual Damascene

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8229062 - Transmission mask with differential attenuation to improve ISO-dense proximity (2012-07-24),

2. 7807342 - Transmission mask with differential attenuation to improve ISO-dense proximity (2010-10-05),

3. 7633601 - Method and related operation system for immersion lithography (2009-12-15),

4. 7476472 - Method for designing photomask (2009-01-13),

5. 7268070 - Profile improvement method for patterning (2007-09-11),

6. 7105255 - EUV reflection mask and lithographic process using the same (2006-09-12),

7. 7074528 - Effective assist pattern for nested and isolated contacts (2006-07-11),

8. 7052808 - Transmission mask with differential attenuation to improve ISO-dense proximity (2006-05-30),

9. 7018788 - Phase shifting lithographic process (2006-03-28),

10. 6866967 - Structure of phase shifting mask (2005-03-15),

11. 6849393 - Phase shifting lithographic process (2005-02-01),

12. 6844143 - Sandwich photoresist structure in photolithographic process (2005-01-18),

13. 6740473 - Method for shrinking critical dimension of semiconductor devices (2004-05-25),

14. 6534412 - Method for removing native oxide (2003-03-18),

15. 6511891 - Method of preventing toppling of lower electrode through flush cleaning (2003-01-28),

Title: Inventor Benjamin Szu-Min Lin

Introduction: Benjamin Szu-Min Lin is a renowned inventor based in Hsinchu, Taiwan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Benjamin Szu-Min Lin holds several patents in the areas of semiconductor technology, renewable energy, and artificial intelligence, showcasing his diverse expertise and innovative mindset.

Career Highlights: With a career spanning over two decades, Benjamin Szu-Min Lin has worked with leading tech companies and research institutions, playing a key role in developing cutting-edge solutions that have revolutionized the industry.

Collaborations: Throughout his career, Benjamin Szu-Min Lin has collaborated with top engineers, scientists, and researchers globally, fostering a culture of innovation and knowledge sharing that has led to numerous successful projects and inventions.

Conclusion: Benjamin Szu-Min Lin's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.

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