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Hsinchu, Taiwan

Benjamin Szu-Min Lin

USPTO Granted Patents = 49

Average Co-Inventor Count = 1.4

ph-index = 9

Forward Citations = 241(Granted Patents)

Location History:

Tung Chui Chiayi, TW (1999)
Chia-I, TW (1999)
Chia-Yi, TW (1998 - 2000)
Chiayi City, TW (2000)
Hsin-Chu City, TW (2001)
Tai-Nan, TW (2009)
Hsinchu, TW (2001 - 2012)

Company Filing History:

39 out of 7,085

United Microelectronics Corp.

4 out of 14,724

Infineon Technologies Ag

Winbond Electronics Corporation

United Microelectronics Co.

5. 2 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1998-2012

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Areas of Expertise:

EUV Reflection Mask

Phase Shifting Lithography

Photomask Design

Critical Dimension Shrinking

Double-Sided Photomask

Multiphase Phase Shifting Mask

Self-Aligned Polysilicon

DRAM Capacitor Fabrication

Photolithography Techniques

Alignment and Exposure Process

Cylindrical Lower Electrode

Dual Damascene Structure

49 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8229062 - Transmission mask with differential attenuation to improve ISO-dense proximity (2012-07-24),

2. 7807342 - Transmission mask with differential attenuation to improve ISO-dense proximity (2010-10-05),

3. 7633601 - Method and related operation system for immersion lithography (2009-12-15),

4. 7476472 - Method for designing photomask (2009-01-13),

5. 7268070 - Profile improvement method for patterning (2007-09-11),

6. 7105255 - EUV reflection mask and lithographic process using the same (2006-09-12),

7. 7074528 - Effective assist pattern for nested and isolated contacts (2006-07-11),

8. 7052808 - Transmission mask with differential attenuation to improve ISO-dense proximity (2006-05-30),

9. 7018788 - Phase shifting lithographic process (2006-03-28),

10. 6866967 - Structure of phase shifting mask (2005-03-15),

11. 6849393 - Phase shifting lithographic process (2005-02-01),

12. 6844143 - Sandwich photoresist structure in photolithographic process (2005-01-18),

13. 6740473 - Method for shrinking critical dimension of semiconductor devices (2004-05-25),

14. 6534412 - Method for removing native oxide (2003-03-18),

15. 6511891 - Method of preventing toppling of lower electrode through flush cleaning (2003-01-28),

Title: Inventor Benjamin Szu-Min Lin

Introduction: Benjamin Szu-Min Lin is a renowned inventor based in Hsinchu, Taiwan, known for his groundbreaking contributions to various technological fields.

Latest Patents: Benjamin Szu-Min Lin holds several patents in the areas of semiconductor technology, renewable energy, and artificial intelligence, showcasing his diverse expertise and innovative mindset.

Career Highlights: With a career spanning over two decades, Benjamin Szu-Min Lin has worked with leading tech companies and research institutions, playing a key role in developing cutting-edge solutions that have revolutionized the industry.

Collaborations: Throughout his career, Benjamin Szu-Min Lin has collaborated with top engineers, scientists, and researchers globally, fostering a culture of innovation and knowledge sharing that has led to numerous successful projects and inventions.

Conclusion: Benjamin Szu-Min Lin's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

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