The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2005
Filed:
Jul. 03, 2002
Benjamin Szu-min Lin, Hsin-Chu, TW;
Benjamin Szu-Min Lin, Hsin-Chu, TW;
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
A phase shifting mask is disclosed in this present invention. The above-mentioned phase shifting mask comprises a quartz layer and a plurality of transmission adjustor layer onto the quartz layer. By employing the above-mentioned phase shifting mask, the material of the transmission adjustors has not to be changed with the light source. Furthermore, the contrast of the phase shifting mask of this invention is better than the contrast of the binary mask and the half-tone mask in the prior art. Therefore, this invention provides a more efficient mask, and the phase shifting mask according to this present invention can improve the resolution in photolithography.