The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2003

Filed:

Jun. 14, 2001
Applicant:
Inventors:

Nathna Sun, Taipei, TW;

Benjamin Szu-Min Lin, Hsinchu, TW;

Chuan-Fu Wang, Taipei Hsien, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/120 ;
U.S. Cl.
CPC ...
H01L 2/120 ;
Abstract

A method of forming the lower electrode of a capacitor capable of withstanding the flushing force produced by a cleaning agent. A lower electrode having a rectangular profile when viewed from the top is provided. The lower electrode is bounded by a pair of ends and a pair of sides. The ends and the sides are linked together. The ends have a wedge shape. The sides have edges that cave in towards the center, thereby forming a recess region between the sides. A flushing operation is carried out using a cleaning solution. The cleaning solution flows from one end of the electrode to the other end along the sides.


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