The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Jul. 22, 2005
Ming-feng Shieh, Tainan County, TW;
Benjamin Szu-min Lin, Hsinchu, TW;
Chun-chi Yu, Taipei, TW;
Jian-shin Liou, Tainan County, TW;
Ming-Feng Shieh, Tainan County, TW;
Benjamin Szu-Min Lin, Hsinchu, TW;
Chun-Chi Yu, Taipei, TW;
Jian-Shin Liou, Tainan County, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
The present invention provides a method for designing a mask. First, a main pattern including at least a strip pattern is formed on the mask substrate. A shift feature is added to one end of the strip pattern of the main pattern. Either the phase shift or the optical transmission or both of the shift feature can be adjusted to optimize the resultant critical dimension between line-ends of the main pattern, thus improving pullback of the line-ends of the strip pattern in the main pattern.