This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: The Innovative Contributions of Jian-Shin Liou
Introduction
Jian-Shin Liou is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of photomask design, showcasing his expertise through his innovative patent.
Latest Patents
Liou holds a patent titled "Method for designing photomask." This invention provides a method for designing a mask by forming a main pattern that includes at least a strip pattern on the mask substrate. A shift feature is added to one end of the strip pattern, allowing for adjustments in either the phase shift or optical transmission, or both. This optimization improves the resultant critical dimension between line-ends of the main pattern, enhancing the pullback of the line-ends of the strip pattern.
Career Highlights
Liou is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work there has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in photomask technology.
Collaborations
Liou has collaborated with talented coworkers such as Ming-Feng Shieh and Benjamin Szu-Min Lin. Their combined efforts in research and development have furthered the progress in their respective fields.
Conclusion
Jian-Shin Liou's contributions to photomask design through his patent demonstrate his innovative spirit and commitment to advancing technology. His work continues to influence the semiconductor industry positively.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile