The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Mar. 14, 2006
Yong-fa Huang, Yun-Lin Hsien, TW;
Benjamin Szu-min Lin, Tai-Nan, TW;
Chun-chi Yu, Taipei, TW;
Huan-ting Tseng, Kao-Hsiung Hsien, TW;
Bo-jou LU, Tainan Hsien, TW;
Yong-Fa Huang, Yun-Lin Hsien, TW;
Benjamin Szu-Min Lin, Tai-Nan, TW;
Chun-Chi Yu, Taipei, TW;
Huan-Ting Tseng, Kao-Hsiung Hsien, TW;
Bo-Jou Lu, Tainan Hsien, TW;
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
To avoid the yield of wafers that undergo immersion lithography influencing by delay of post exposure baking (PEB), an operation system adjusts a speed of inputting the wafers to undergo immersion lithography according to a status of wafers that have finished exposure and are waiting for baking. Therefore, the wafers that have finished exposure are transmitted to be baked efficiently and on time.