Location History:
- Yun-Lin Hsien, TW (2009)
- Tainan, TW (2013)
Company Filing History:
Years Active: 2009-2013
Title: Yong-Fa Huang: Innovator in Photoresist Technology
Introduction
Yong-Fa Huang is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of photoresist technology, holding a total of 2 patents. His innovative methods have advanced the processes used in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Method for forming photoresist patterns." This method involves providing a substrate, forming a bi-layered photoresist on the substrate, and performing a photolithography process to pattern the bi-layered photoresist. The bi-layered photoresist consists of a first photoresist layer and a second photoresist layer positioned between the first layer and the substrate. Notably, the first photoresist layer has a first refraction index, while the second photoresist layer has a second refraction index that is larger than the first.
Another significant patent is "Method and related operation system for immersion lithography." This invention addresses the challenges posed by the yield of wafers undergoing immersion lithography, particularly the delays caused by post-exposure baking (PEB). The operation system adjusts the speed of inputting wafers for immersion lithography based on the status of wafers that have completed exposure and are awaiting baking. This ensures that the wafers are transmitted for baking efficiently and on time.
Career Highlights
Yong-Fa Huang is currently employed at United Microelectronics Corporation, where he continues to innovate in the semiconductor industry. His work has been instrumental in enhancing the efficiency and effectiveness of lithography processes.
Collaborations
He collaborates with talented coworkers, including Chun-Chi Yu and Benjamin Szu-Min Lin, who contribute to the advancement of their projects and innovations.
Conclusion
Yong-Fa Huang's contributions to photoresist technology and his innovative patents reflect his dedication to advancing semiconductor manufacturing processes. His work continues to influence the industry positively.