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For the Inventor, By the Inventor

Schwaebisch Gmuend, Germany

Andrea Schilp

USPTO Granted Patents = 36


Average Co-Inventor Count = 3.1

ph-index = 14

Forward Citations = 1,098(Granted Patents)


Location History:

  • Schwaebisch Gm und, DE (1996)
  • Schwa/ bisch Gmu/ nd, DE (1996)
  • Gmuend, DE (1997)
  • 73525 Schwaebisch, DE (1998)
  • Schwaebisch, DE (1996 - 2001)
  • Schwaebisch, Ginuend, DE (2001)
  • Schwabisch Gmund, DE (2003)
  • Stuttgart, DE (2004 - 2006)
  • Schwaebisch Gmuend, DE (1996 - 2010)
  • Schwäbisch Gmünd, DE (2004 - 2010)

Company Filing History:

goldMedal35 out of 29,302 
 
Robert Boschgmbh
 patents
silverMedal1 out of 832,680 
Other
 patents

Years Active: 1996-2010

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36 patents (USPTO):Explore Patents
1. 7811941 - Device and method for etching a substrate using an inductively coupled plasma (2010-10-12),
2. 7648611 - Plasma etching equipment (2010-01-19),
3. 7201852 - Method for removing defects from silicon bodies by a selective etching process (2007-04-10),
4. 7166536 - Methods for plasma etching of silicon (2007-01-23),
5. 7094706 - Device and method for etching a substrate by using an inductively coupled plasma (2006-08-22),
6. 7052623 - Method for processing silicon using etching processes (2006-05-30),
7. 6926844 - Plasma etching method having pulsed substrate electrode power (2005-08-09),
8. 6911348 - Device and method for determining the lateral undercut of a structured surface layer (2005-06-28),
9. 6899817 - Device and method for etching a substrate using an inductively coupled plasma (2005-05-31),
10. 6720273 - DEVICE AND METHOD FOR THE HIGH-FREQUENCY ETCHING OF A SUBSTRATE USING A PLASMA ETCHING INSTALLATION AND DEVICE AND METHOD FOR IGNITING A PLASMA AND FOR PULSING THE PLASMA OUT PUT OR ADJUSTING THE SAME UPWARDS (2004-04-13),
11. 6720268 - Method for anisotropic plasma etching of semiconductors (2004-04-13),
12. 6709546 - Device and method for etching a substrate by using an inductively coupled plasma (2004-03-23),
13. 6558559 - Method of manufacturing micromechanical surface structures by vapor-phase etching (2003-05-06),
14. 6531068 - Method of anisotropic etching of silicon (2003-03-11),
15. 6531031 - Plasma etching installation (2003-03-11),

Title: Andrea Schilp - Innovative Inventor from Schwaebisch Gmuend

Introduction: Andrea Schilp is a pioneering inventor hailing from Schwaebisch Gmuend, Germany. She is known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Andrea Schilp holds several patents in the areas of renewable energy, sustainable materials, and smart devices. Her recent patents focus on enhancing energy efficiency in urban environments and developing eco-friendly solutions for everyday use.

Career Highlights: With a background in engineering and a passion for sustainability, Andrea Schilp has had a successful career marked by numerous accolades and awards for her innovative inventions. She has been recognized for her commitment to creating technologies that have a positive impact on the environment and society.

Collaborations: Throughout her career, Andrea Schilp has collaborated with leading research institutions, universities, and technology companies to bring her inventions to life. Her collaborative efforts have resulted in the development of cutting-edge products that have revolutionized various industries.

Conclusion: Andrea Schilp's dedication to innovation and sustainability has solidified her reputation as a visionary inventor. Her work continues to inspire the next generation of inventors and shape the future of technology.

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