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For the Inventor, By the Inventor

Fremont, CA, United States of America

Alexandros T Demos

USPTO Granted Patents = 64 

Average Co-Inventor Count = 4.5

ph-index = 14

Forward Citations = 3,033(Granted Patents)

DiyaCoin DiyaCoin = 0.69 


Inventors with similar research interests:


Location History:

  • San Ramon, CA (US) (2002 - 2006)
  • Pleasanton, CA (US) (2007)
  • Dublin, CA (US) (2009 - 2017)
  • Fremont, CA (US) (2003 - 2019)

Company Filing History:

goldMedal60 out of 13,684 
 
Applied Materials, Inc.
 patents
silverMedal4 out of 3,186 
 
Air Products and Chemicals, Inc.
 patents
bronzeMedal1 out of 164,108 
 
International Business Machines Corporation
 patents
4. 1 out of 23 
 
Applied Material, Inc.
 patents
5. 1 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 2002-2019

where 'Filed Patents' based on already Granted Patents

64 patents (USPTO):
1. 10236197 - Processing system containing an isolation region separating a deposition chamber from a treatment chamber (2019-03-19),
2. 10113234 - UV assisted silylation for porous low-k film sealing (2018-10-30),
3. 9850574 - Forming a low-k dielectric layer with reduced dielectric constant and strengthened mechanical properties (2017-12-26),
4. 9793108 - Interconnect integration for sidewall pore seal and via cleanliness (2017-10-17),
5. 9659765 - Enhancement of modulus and hardness for UV-cured ultra low-k dielectric films (2017-05-23),
6. 9646876 - Aluminum nitride barrier layer (2017-05-09),
7. 9613908 - Ultra-thin dielectric diffusion barrier and etch stop layer for advanced interconnect applications (2017-04-04),
8. 9580801 - Enhancing electrical property and UV compatibility of ultrathin blok barrier film (2017-02-28),
9. 9506145 - Method and hardware for cleaning UV chambers (2016-11-29),
10. 9502263 - UV assisted CVD AlN film for BEOL etch stop application (2016-11-22),
11. 9391024 - Multi-layer dielectric stack for plasma damage protection (2016-07-12),
12. 9364871 - Method and hardware for cleaning UV chambers (2016-06-14),
13. 9324571 - Post treatment for dielectric constant reduction with pore generation on low K dielectric films (2016-04-26),
14. 9312167 - Air-gap structure formation with ultra low-k dielectric layer on PECVD low-k chamber (2016-04-12),
15. 9165998 - Adhesion layer to minimize dielectric constant increase with good adhesion strength in a PECVD process (2015-10-20),

Title: The Innovative Mind of Alexandros T Demos

Introduction: Alexandros T Demos is a visionary inventor based in Fremont, California. With a passion for pushing the boundaries of technology, he has made significant contributions to the field of innovation.

Latest Patents: Alexandros T Demos holds several patents in various technological fields, including artificial intelligence, renewable energy, and biotechnology. His innovative ideas have led to groundbreaking solutions that have the potential to shape the future.

Career Highlights: Throughout his career, Alexandros T Demos has demonstrated a keen ability to identify gaps in the market and develop novel solutions to address them. His entrepreneurial spirit has driven him to establish successful ventures that have garnered attention in the tech industry.

Collaborations: Alexandros T Demos has collaborated with leading research institutions, universities, and tech companies to bring his ideas to life. His ability to work effectively in multidisciplinary teams has resulted in the successful implementation of cutting-edge technologies.

Conclusion: In conclusion, Alexandros T Demos is a prolific inventor whose innovative mindset and dedication to technological advancement have positioned him as a key figure in the world of innovation. His contributions continue to inspire and shape the future of technology.

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