The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2016
Filed:
Jun. 13, 2016
Applied Materials, Inc., Santa Clara, CA (US);
Sanjeev Baluja, Campbell, CA (US);
Alexandros T. Demos, Fremont, CA (US);
Kelvin Chan, San Ramon, CA (US);
Juan Carlos Rocha-Alvarez, San Carlos, CA (US);
Scott A. Hendrickson, Brentwood, CA (US);
Abhijit Kangude, Mountain View, CA (US);
Inna Turevsky, Santa Clara, CA (US);
Mahendra Chhabra, San Jose, CA (US);
Thomas Nowak, Cupertino, CA (US);
Daping Yao, Portland, OR (US);
Bo Xie, San Jose, CA (US);
Daemian Raj, Fremont, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NFand Oto remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.