Santa Clara, CA, United States of America

Inna Turevsky

USPTO Granted Patents = 2 

Average Co-Inventor Count = 12.0

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2016

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: Inna Turevsky: Innovator in UV Chamber Cleaning Technologies

Introduction

Inna Turevsky is a prominent inventor based in Santa Clara, CA (US). She has made significant contributions to the field of cleaning technologies for UV chambers. With a total of 2 patents, her work focuses on enhancing the efficiency and effectiveness of cleaning processes in semiconductor manufacturing.

Latest Patents

Inna's latest patents include a method and hardware for cleaning UV chambers. This innovative cleaning method involves the use of a first cleaning gas, a second cleaning gas, and a purge gas introduced through openings in the chamber. The first cleaning gas is an oxygen-containing gas, such as ozone, which effectively removes carbon residues. The second cleaning gas is a remote plasma of NF and O, designed to eliminate silicon residues. The UV chamber is equipped with two UV transparent showerheads, along with a UV window in the chamber lid, which together define a gas volume near the UV window and a distribution volume below it. A purge gas is flowed through the gas volume while one or more cleaning gases are introduced into the distribution volume, preventing the cleaning gases from contacting the UV transparent window.

Career Highlights

Inna Turevsky is currently employed at Applied Materials, Inc., where she continues to develop innovative solutions in the field of semiconductor manufacturing. Her expertise in cleaning technologies has positioned her as a key contributor to advancements in this area.

Collaborations

Inna has collaborated with notable colleagues, including Sanjeev Baluja and Alexandros T Demos, to further enhance the effectiveness of her inventions.

Conclusion

Inna Turevsky's contributions to UV chamber cleaning technologies demonstrate her commitment to innovation and excellence in the semiconductor industry. Her patents reflect a deep understanding of the challenges faced in manufacturing processes, and her work continues to pave the way for advancements in this critical field.

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