Applied Materials, Inc.

Inna Turevsky

Juan Carlos Rocha-Alvarez

Sanjeev Baluja

Kelvin Chan

Alexandros T Demos

Thomas E Nowak

Bo Xie

Scott A Hendrickson

Abhijit Ashok Kangude

Daping Yao

Daemian Raj

Mahendra Chhabra

A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NFand Oto remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.

Method and hardware for cleaning UV chambers

Growing community of inventors

Santa Clara, CA, United States of America

Inna Turevsky