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For the Inventor, By the Inventor

Portland, OR, United States of America

Daping Yao

USPTO Granted Patents = 14

Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 124(Granted Patents)


Location History:

  • Portland, OR (US) (2013 - 2019)
  • San Jose, CA (US) (2019 - 2023)

Company Filing History:

goldMedal14 out of 13,684 
 
Applied Materials, Inc.
 patents

Years Active: 2013-2023

where 'Filed Patents' based on already Granted Patents

14 patents (USPTO):
1. 11628456 - Apparatus for increasing flux from an ampoule (2023-04-18),
2. 11133155 - Apparatus for depositing metal films with plasma treatment (2021-09-28),
3. 11059061 - Apparatus for increasing flux from an ampoule (2021-07-13),
4. 10752990 - Apparatus and methods to remove residual precursor inside gas lines post-deposition (2020-08-25),
5. 10640870 - Gas feedthrough assembly (2020-05-05),
6. 10600685 - Methods to fill high aspect ratio features on semiconductor substrates with MOCVD cobalt film (2020-03-24),
7. 10453657 - Apparatus for depositing metal films with plasma treatment (2019-10-22),
8. 10283345 - Methods for pre-cleaning conductive materials on a substrate (2019-05-07),
9. 9506145 - Method and hardware for cleaning UV chambers (2016-11-29),
10. 9478437 - Methods for repairing low-k dielectrics using carbon plasma immersion (2016-10-25),
11. 9460959 - Methods for pre-cleaning conductive interconnect structures (2016-10-04),
12. 9364871 - Method and hardware for cleaning UV chambers (2016-06-14),
13. 8664126 - Selective deposition of polymer films on bare silicon instead of oxide surface (2014-03-04),
14. 8492177 - Methods for quantitative measurement of a plasma immersion process (2013-07-23),

Title: Daping Yao: Innovator in Semiconductor Manufacturing

Introduction

Daping Yao is a prominent inventor based in Portland, OR (US), known for his significant contributions to the field of semiconductor manufacturing. With a total of 14 patents to his name, Yao has made remarkable advancements that enhance the efficiency and effectiveness of semiconductor processes.

Latest Patents

Among his latest patents is the "Apparatus for increasing flux from an ampoule." This invention describes ampoules designed for semiconductor manufacturing precursors, featuring a container with an inlet port and an outlet port. The inlet port includes a showerhead with at least two angled nozzles, directing gas flow within the cavity to ensure that the flow is not perpendicular to the surface of the liquid within the ampoule. Another notable patent is the "Apparatus for depositing metal films with plasma treatment." This invention provides a gas delivery apparatus for use in a radio frequency (RF) processing apparatus, which includes a conductive gas line and flanges, along with a block of ferrite material surrounding the gas line.

Career Highlights

Daping Yao is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work focuses on developing innovative solutions that improve semiconductor manufacturing processes. His extensive experience and expertise have positioned him as a key figure in the field.

Collaborations

Yao has collaborated with several talented individuals in his field, including Mei Yin Chang and Jiang Lu. These collaborations have contributed to the advancement of technology in semiconductor manufacturing.

Conclusion

Daping Yao's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his importance in the industry. His work continues to influence the development of efficient manufacturing processes, making him a notable inventor in the field.

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