The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2019

Filed:

Jul. 05, 2017
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Daping Yao, San Jose, CA (US);

Hyman W. H. Lam, San Jose, CA (US);

John C. Forster, Mountain View, CA (US);

Jiang Lu, Milpitas, CA (US);

Can Xu, San Jose, CA (US);

Dien-Yeh Wu, San Jose, CA (US);

Paul F. Ma, Santa Clara, CA (US);

Mei Chang, Saratoga, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/513 (2006.01); C23C 16/505 (2006.01); C23C 16/52 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); C23C 16/455 (2013.01); C23C 16/45563 (2013.01); C23C 16/45572 (2013.01); C23C 16/505 (2013.01); C23C 16/509 (2013.01); C23C 16/513 (2013.01); C23C 16/52 (2013.01); C23C 16/06 (2013.01); H01J 2237/002 (2013.01); H01J 2237/0213 (2013.01); H01J 2237/3321 (2013.01);
Abstract

Embodiments of a gas delivery apparatus for use in a radio frequency (RF) processing apparatus are provided herein. In some embodiments, a gas delivery apparatus for use in a radio frequency (RF) processing apparatus includes: a conductive gas line having a first end and a second end; a first flange coupled to the first end; a second flange coupled to the second end, wherein the conductive gas line extends through and between the first and second flanges; and a block of ferrite material surrounding the conductive gas line between the first and second flanges.


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