Milpitas, CA, United States of America

Jiang Lu

This inventor holds 23 USPTO granted patents and 26 published patent applications and 1 EPO patent, primarily in Semiconductor Processing. Top assignee: Applied Materials, Inc.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jiang Lu. Retrieved from https://idiyas.com/inventor/jiang-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 23 

% Patents Active = 69.6

 

Average Co-Inventor Count = 6.7

ph-index = 4

Forward Citations = 29(Granted Patents)


Location History:

  • Milipitas, CA (US) (2015)
  • Santa Clara, CA (US) (2015 - 2016)
  • Milpitas, CA (US) (2016 - 2021)

Company Filing History:


Years Active: 2015-2026

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Areas of Expertise:
Thermal CVD
Tungsten Gap-Fill
Silicon Nitride
Selective Metal Deposition
Cobalt Films
Atomic Layer Deposition
Substrate Processing
High Aspect Ratio Features
Plasma Treatment
Residual Precursor Removal
Low Resistivity Contacts
Gradient Oxidation
23 patents (USPTO):Explore Patents

Title: The Innovative Mind of Jiang Lu

Introduction

Jiang Lu, an accomplished inventor based in Milpitas, CA, has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With a remarkable portfolio of 13 patents, Jiang's work reflects his dedication to advancing technology in the industry. His recent inventions focus on enhancing the efficiency and effectiveness of gas delivery and deposition processes.

Latest Patents

Among Jiang Lu's latest patents is the "Apparatus for depositing metal films with plasma treatment." This invention details a gas delivery apparatus designed for use in a radio frequency (RF) processing apparatus. The apparatus features a conductive gas line, comprising a first and a second end, coupled with flanges and surrounded by a ferrite material. This design aims to improve the deposition of metal films through enhanced gas delivery.

Another significant patent is the "Apparatus and methods to remove residual precursor inside gas lines post-deposition." This invention presents an innovative method for supplying gas to a processing chamber. The apparatus includes an inlet and outlet line, each with valves connected to an ampoule, as well as a bypass line. This system enables the effective removal of precursor residues from the delivery lines, ensuring cleaner and more efficient processing.

Career Highlights

Jiang Lu's professional journey is defined by his tenure at Applied Materials, Inc., where he has played an integral role in advancing semiconductor manufacturing technologies. His innovative solutions have not only led to numerous patents but have also contributed to the advancement of industry practices.

Collaborations

Throughout his career, Jiang has collaborated with esteemed colleagues, including Paul F. Ma and Mei Yin Chang. These partnerships have fostered a collaborative environment that promotes innovative thinking and problem-solving, further enhancing the development of groundbreaking technologies.

Conclusion

Jiang Lu’s inventive spirit and dedication to enhancing semiconductor manufacturing underscore his importance in the field. With 13 patents, his contributions continue to influence technology and set new benchmarks for innovation in the industry. As a key figure at Applied Materials, Inc., Jiang Lu's work exemplifies the intersection of creativity and engineering, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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