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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10752990 B1

PDFFull Text
Date of Patent:
Aug. 25, 2020

Filed:

Mar. 28, 2017

Apparatus and methods to remove residual precursor inside gas lines post-deposition

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Daping Yao, San Jose, CA (US);

Kenric Choi, San Jose, CA (US);

Xiaoxiong Yuan, San Jose, CA (US);

Jiang Lu, Milpitas, CA (US);

Can Xu, San Jose, CA (US);

Paul F. Ma, Santa Clara, CA (US);

Mei Chang, Saratoga, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Servilla Whitney LLC

Primary Examiner:

Jessica Cahill

Assistant Examiner:

Patrick C Williams

Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/448 (2006.01); C23C 16/18 (2006.01); F16K 31/12 (2006.01); F16K 31/60 (2006.01);
U.S. Cl.
CPC ...
C23C 16/455 (2013.01); C23C 16/4408 (2013.01); C23C 16/4481 (2013.01); F16K 31/12 (2013.01); F16K 31/60 (2013.01); C23C 16/18 (2013.01); C23C 16/4402 (2013.01); Y10T 137/3115 (2015.04);
Abstract

Apparatus and methods for supplying a gas to a processing chamber are described. The apparatus comprises an inlet line and an outlet line, each with two valves, in fluid communication an ampoule. A bypass line connects the inlet valve and outlet valve closest to the ampoule. The apparatus and methods of use allow a precursor residue to be removed from the delivery lines of a processing chamber.

Find Patent Forward Citations

Yao, Daping. (2020). Apparatus and methods to remove residual precursor inside gas lines post-deposition (U.S. Patent No. 10752990). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10752990

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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