Santa Clara, CA, United States of America

Paul F Ma

This inventor holds 88 USPTO granted patents and 46 published patent applications and 2 EPO patents, primarily in Semiconductor Processing (CPC class H01L21-28562). Top assignees: Applied Materials, Inc., Asm IP Holding B.v., Cornell University. Active years: 2009-2026.

USPTO Granted Patents = 88 (Patent Applications = 46)

% Patents Active = 88.6

EPO Patents = 2 (Patent Applications = 3)

Average Co-Inventor Count = 5.4

ph-index = 9

Forward Citations = 1,100(Granted Patents)

Forward Citations (Not Self Cited) = 1,024(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Sunnyvale, CA (US) (2009 - 2015)
Santa Clara, CA (US) (2010 - 2023)
Scottsdale, AZ (US) (2020 - 2024)

Company Filing History:

69 out of 14,433

Applied Materials, Inc.

Years Active: 2009-2026

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Areas of Expertise:

Selective Deposition

Doping Control

Defect Reduction

Metal Films

Gas Distribution

High Aspect Ratio

Wafer Treatment

Threshold Voltage

Atomic Layer Deposition

Self-Assembled Monolayers

Vapor Deposition

Cobalt Film

88 patents (USPTO):Sort by Forward CitationsExplore Patents

1. D1151739 - Weighted lift pin (2026-10-06),

2. 12746584 - Methods and apparatus for cleaning a vessel (2026-09-29),

3. 12729430 - Metal-on-metal deposition methods for filling a gap feature on a substrate surface (2026-09-08),

4. 12692599 - Fill vessels and connectors for chemical sublimators (2026-07-28),

5. 12686917 - Methods for depositing a film on a surface of a substrate by cyclical deposition methods including pulsed purge processes (2026-07-21),

6. 12595557 - Method of forming structure including a doped adhesion film (2026-04-07),

7. 12473641 - Apparatus for providing a gas mixture to a reaction chamber and method of using same (2025-11-18),

8. 12472539 - Methods and apparatus for cleaning a vessel (2025-11-18),

9. D1099184 - Weighted lift pin (2025-10-21),

10. 12351903 - Method and system for depositing molybdenum layers (2025-07-08),

11. 12241158 - Method for forming structures including transition metal layers (2025-03-04),

12. 12237171 - Method of forming vanadium nitride layer and structure including the vanadium nitride layer (2025-02-25),

13. 12006572 - Reactor system including a gas distribution assembly for use with activated species and method of using same (2024-06-11),

14. 11901175 - Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer (2024-02-13),

15. 11885013 - Method of forming vanadium nitride layer and structure including the vanadium nitride layer (2024-01-30),

Title: The Innovative Journey of Paul F Ma

Introduction: Paul F Ma, a visionary inventor based in Santa Clara, CA, has made significant contributions to the field of technology through his groundbreaking innovations.

Latest Patents: Paul F Ma holds several patents in the areas of artificial intelligence, machine learning, and semiconductor technology, showcasing his expertise in cutting-edge technologies.

Career Highlights: With a career spanning over two decades, Paul F Ma has worked for leading tech companies, where he played a key role in developing next-generation products and solutions. His innovative mindset and problem-solving skills have led to the successful implementation of various projects.

Collaborations: Throughout his career, Paul F Ma has collaborated with top researchers, engineers, and scientists in the industry, fostering a culture of innovation and knowledge sharing. His collaborative efforts have resulted in the development of revolutionary technologies that have shaped the tech landscape.

Conclusion: Paul F Ma's relentless pursuit of innovation and his passion for pushing the boundaries of technology have established him as a prominent figure in the world of inventions. His contributions continue to inspire future generations of inventors and pave the way for technological advancements.