The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2025

Filed:

Oct. 12, 2023
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Giuseppe Alessio Verni, Ottignies, BE;

Qi Xie, Wilsele, BE;

Henri Jussila, Espoo, FI;

Charles Dezelah, Helsinki, FI;

Jiyeon Kim, Phoenix, AZ (US);

Eric James Shero, Phoenix, AZ (US);

Paul Ma, Scottsdale, AZ (US);

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); H01L 29/49 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28556 (2013.01); H01L 29/4966 (2013.01);
Abstract

Methods and systems for depositing vanadium nitride layers onto a surface of the substrate and structures and devices formed using the methods are disclosed. An exemplary method includes using a cyclical deposition process, depositing a vanadium nitride layer onto a surface of the substrate. The cyclical deposition process can include providing a vanadium halide precursor to the reaction chamber and separately providing a nitrogen reactant to the reaction chamber. The cyclical deposition process may desirably be a thermal cyclical deposition process.


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