Company Filing History:
Years Active: 2022-2025
Title: Innovations of Henri Jussila in Vapor Deposition Technologies
Introduction
Henri Jussila is a notable inventor based in Espoo, Finland, recognized for his contributions to the field of vapor deposition processes. With a total of six patents to his name, Jussila has made significant advancements in the formation of oxide and nitride films, which are essential in various technological applications.
Latest Patents
Jussila's latest patents include innovative methods for the deposition of oxides and nitrides. His work on vapor deposition processes, particularly atomic layer deposition (ALD), employs a deposition enhancing precursor to form a variety of films, including metal oxides, metal nitrides, and silicon-based films. These methods enable improved thin film formation and increased deposition rates, which are crucial for enhancing the performance of electronic devices. Another significant patent involves the method of forming vanadium nitride layers, utilizing a cyclical deposition process that includes providing a vanadium halide precursor and a nitrogen reactant to the reaction chamber.
Career Highlights
Henri Jussila is currently associated with ASM IP Holding B.V., where he continues to innovate in the field of material science. His expertise in vapor deposition technologies has positioned him as a key figure in the development of advanced materials for various applications.
Collaborations
Jussila has collaborated with notable colleagues such as Qi Xie and Chiyu Zhu, contributing to the advancement of their shared research interests in vapor deposition techniques.
Conclusion
Henri Jussila's work in vapor deposition technologies has significantly impacted the field of material science, showcasing his innovative spirit and dedication to advancing technology. His contributions continue to influence the development of new materials and processes in various industries.