The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2026
Filed:
May. 24, 2024
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Do Han Kim, Phoenix, AZ (US);
Jereld Lee Winkler, Gilbert, AZ (US);
Amit Mishra, Tempe, AZ (US);
Paul MA, Scottsdale, AZ (US);
Todd Robert Dunn, Cave Creek, AZ (US);
Moataz Bellah Mousa, Chandler, AZ (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/04 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/403 (2013.01); C23C 16/045 (2013.01); C23C 16/4408 (2013.01); C23C 16/45525 (2013.01); C23C 16/45527 (2013.01); C23C 16/45557 (2013.01);
Abstract
Methods for depositing a film on a surface of substrate by cyclical deposition methods including pulsed purge processed are disclosed. The pulsed purge processes include introducing a purge gas into a reaction chamber at a first flow rate, and introducing a purge gas into the reaction chamber at second flow rate, the first flow rate being different to the second flow rate.