The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 08, 2025
Filed:
May. 25, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Liqi Wu, San Jose, CA (US);
Feng Q. Liu, San Jose, CA (US);
Bhaskar Jyoti Bhuyan, San Jose, CA (US);
James Hugh Connolly, Dublin, IE;
Zhimin Qi, Fremont, CA (US);
Jie Zhang, Sunnyvale, CA (US);
Wei Dou, Santa Clara, CA (US);
Aixi Zhang, Sunnyvale, CA (US);
Mark Saly, Santa Clara, CA (US);
Jiang Lu, Milpitas, CA (US);
Rongjun Wang, Dublin, CA (US);
David Thompson, San Jose, CA (US);
Xianmin Tang, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the disclosure relate to methods for selectively removing metal material from the top surface and sidewalls of a feature. The metal material which is covered by a flowable polymer material remains unaffected. In some embodiments, the metal material is formed by physical vapor deposition resulting in a relatively thin sidewall thickness. Any metal material remaining on the sidewall after removal of the metal material from the top surface may be etched by an additional etch process. The resulting metal layer at the bottom of the feature facilitates selective metal gapfill of the feature.