Liqi Wu

Title: The Innovative Mind of Liqi Wu: A Patent Landscape

Introduction

Liqi Wu is a prominent inventor based in San Jose, California, known for his impressive portfolio of 19 patents. His innovative work is significant in the fields of semiconductor manufacturing and materials engineering, where his contributions have led to advancements in efficient and selective metal processing.

Latest Patents

Liqi Wu's most recent patents showcase his expertise in selective metal removal and dual silicide processes. One notable invention, titled "Selective Metal Removal with Flowable Polymer," describes methods for effectively removing metal material from surfaces while leaving the underlying coated areas intact. This technique is particularly advantageous when a thin sidewall thickness, achieved through physical vapor deposition, is critical. Additionally, his patent on the "Dual Silicide Process Using Ruthenium Silicide" outlines methods for forming semiconductor structures. This involves the precise patterning of substrates to deposit ruthenium and titanium silicide layers on n and p transistors, enhancing their performance without breaking vacuum during the process.

Career Highlights

Liqi Wu's career includes pivotal roles at respected companies in the semiconductor industry, such as Applied Materials, Inc. and Novellus Systems Incorporated. His work at these organizations has placed him at the forefront of technological advancements, particularly in semiconductor fabrication techniques and materials analysis.

Collaborations

Throughout his career, Liqi Wu has collaborated with esteemed professionals such as Paul F. Ma and Chang Ke. These partnerships have fostered an environment of innovation, combining expertise that has undoubtedly contributed to the success of his projects and patents.

Conclusion

Liqi Wu exemplifies the spirit of innovation through his extensive work and achievements in the field of semiconductor technology. His patented processes not only reflect his commitment to pushing the boundaries of engineering but also serve as an inspiration for future inventors. As he continues to develop and refine his ideas, the impact of his contributions is likely to resonate throughout the industry for years to come.