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Orangeburg, NY, United States of America

Materials Research Corporation

USPTO Granted Patents = 106

CIPO Patents = 1

Trademarks = 1

Forward Citations = 5,280

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90 inventors (with patents filed for the assignee):

Steven D Hurwitt (32 out of 45 patents)

Robert F Foster (14 out of 29 patents)

Joseph T Hillman (11 out of 50 patents)

4. Thomas J Hunt (10 out of 28 patents)

5. Paul S Gilman (9 out of 67 patents)

6. Israel Wagner (7 out of 10 patents)

7. Robert G Hieronymi (7 out of 7 patents)

8. Rikhit Arora (6 out of 7 patents)

9. Rene E LeBlanc (6 out of 10 patents)

10. Walter H Class (6 out of 6 patents)

11. Chi-Fung Lo (5 out of 13 patents)

12. Raymond K Lam (5 out of 7 patents)

13. Carl Louis White (4 out of 70 patents)

14. David P Strauss (4 out of 5 patents)

15. Alexander D Lantsman (4 out of 10 patents)

Core Competencies:

Sputtering Targets

Thin Films

Plasma Processing

Magnetic Properties

Chemical Vapor Deposition

Aluminum Alloys

Titanium Nitride

High Purity Materials

Ultra High Purity

Sputter Coating

Wafer Processing

Intermetallic Compounds

106 patents: Sort by Forward Citations

1. 6042777 - Manufacturing of high density intermetallic sputter targets (2000-03-28),

2. 6039788 - Melting and casting of high purity chromium with controlled oxygen (2000-03-21),

3. 6030514 - Method of reducing sputtering burn-in time, minimizing sputtered (2000-02-29),

4. 6010583 - Method of making unreacted metal/aluminum sputter target (2000-01-04),

5. 5993734 - Method for making W/Ti sputtering targets and products in an inert (1999-11-30),

6. 5993575 - Method for fabricating randomly oriented aluminum alloy sputting targets (1999-11-30),

7. 5989673 - Caromium-tantalum oxides (Cr-TaO.sub.x), sputtering targets and thin (1999-11-23),

8. 5975912 - Low temperature plasma-enhanced formation of integrated circuits (1999-11-02),

9. 5896553 - Single phase tungsten-titanium sputter targets and method of producing (1999-04-20),

10. 5858180 - Magnetic field generator, coating method and apparatus including same, (1999-01-12),

11. 5857611 - Sputter target/backing plate assembly and method of making same (1999-01-12),

12. 5846389 - Sputtering target protection device (1998-12-08),

13. 5836506 - Sputter target/backing plate assembly and method of making same (1998-11-17),

14. 5804041 - Method and apparatus for forming a magnetically oriented thin film (1998-09-08),

15. 5795448 - Magnetic device for rotating a substrate (1998-08-18),

Materials Research Corporation, based in Orangeburg, NY, specializes in the development and manufacturing of high-purity sputtering targets and thin film materials. The company focuses on advanced technologies such as plasma processing and chemical vapor deposition, catering to industries that require precise material properties. Their expertise includes aluminum alloys and titanium nitride, emphasizing magnetic properties and high-purity materials essential for various applications in electronics and semiconductor manufacturing.

Profile summary based on public USPTO records.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

106 Patents

#2 in Orangeburg, NY

#225 in New York

#3,599 in US

#7,397 in the World

Orangeburg, NY, United States of America

Materials Research Corporation

Forward Citations = 5,280

90 inventors:

Steven D Hurwitt (32 out of 45 patents)

Robert F Foster (14 out of 29 patents)

Joseph T Hillman (11 out of 50 patents)

4. Thomas J Hunt (10 out of 28 patents)

5. Paul S Gilman (9 out of 67 patents)

Please report any incorrect information to [email protected]

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