Company Filing History:
6 out of 106 
2 out of 58,132 
1 out of 10,381 
Years Active: 1993-2000
Title: Rikhit Arora: Innovator in Low Temperature Deposition Technologies
Introduction
Rikhit Arora is a notable inventor based in Mesa, AZ (US), recognized for his contributions to the field of low temperature deposition technologies. With a total of seven patents to his name, he has made significant advancements in chemical vapor deposition (CVD) and plasma-enhanced chemical vapor deposition (PECVD) methods.
Latest Patents
One of Rikhit Arora's latest patents focuses on a method and apparatus for low temperature deposition of CVD and PECVD films. This innovative approach utilizes a gas-dispersing showerhead positioned within one inch of a rotating substrate. The design includes a cylindrical structure that contains gas over the showerhead, ensuring efficient and uniform deposition of films on the substrate surface. The showerhead is biased with RF energy, acting as an electrode to incite plasma near the substrate for PECVD. This technology allows for low temperature CVD and PECVD, enhancing the efficiency of film deposition processes.
Career Highlights
Throughout his career, Rikhit Arora has worked with prominent companies such as Materials Research Corporation and Sony Corporation. His experience in these organizations has contributed to his expertise in the field of materials science and deposition technologies.
Collaborations
Rikhit has collaborated with notable coworkers, including Robert F Foster and Joseph T Hillman, further enriching his professional journey and expanding his innovative capabilities.
Conclusion
Rikhit Arora's work in low temperature deposition technologies exemplifies his commitment to innovation in the field. His patents and career achievements highlight his significant contributions to advancing CVD and PECVD methods.