Israel Wagner

Title: Israel Wagner: A Pioneer in Sputter Coating Technology

Introduction

Israel Wagner, an innovative inventor based in Monsey, NY, has made significant contributions to the field of sputter coating technology. With a portfolio of 10 patents, his work focuses on maintaining the thickness uniformity of films deposited from targets onto various substrates, a crucial aspect in numerous applications.

Latest Patents

His latest patent, titled "Method and apparatus for sputter coating with variable target to substrate spacing," addresses the challenge of thickness uniformity of sputtered films. As the target surface changes due to consumption, the innovation allows for precise control by measuring the eroded condition of the target using various methods, including power consumption and deposition measurements. A dedicated controller utilizes this data to adjust the distance between the substrate and the target, typically moving the substrate closer to ensure uniform coatings on wafers. The adjustment is executed through a servo or stepper motor in response to signals from the controller, optimizing coating quality over the target's lifespan.

Career Highlights

Israel Wagner's career features critical roles at leading companies, including Materials Research Corporation and Tokyo Electron Limited. His experience at these organizations has contributed to his expertise in the field of sputter coating and related technologies.

Collaborations

Throughout his career, Wagner has collaborated with notable professionals, including Steven D. Hurwitt and Robert G. Hieronymi. These partnerships have further enhanced his work and innovation in the field.

Conclusion

Israel Wagner stands out as a prominent inventor whose work in sputter coating technology is shaping the industry. His dedication to improving coating uniformity through innovative methods reflects his commitment to excellence and advancement in technological processes.