Scottsdale, AZ, United States of America

Joseph T Hillman

USPTO Granted Patents = 50 


Average Co-Inventor Count = 2.6

ph-index = 22

Forward Citations = 4,471(Granted Patents)

Forward Citations (Not Self Cited) = 4,440(Oct 12, 2025)


Inventors with similar research interests:


Company Filing History:


Years Active: 1990-2009

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50 patents (USPTO):Explore Patents

Title: The Innovative Journey of Joseph T Hillman: Pioneering Solutions in CVD Processes

Introduction:

Joseph T Hillman, an esteemed inventor based in Scottsdale, AZ, has made a significant impact in the field of chemical vapor deposition (CVD) processes. With an impressive portfolio of 50 patents, Hillman's innovative contributions have revolutionized the control and management of reaction by-product gases in semiconductor manufacturing.

Latest Patents:

- "Method and apparatus for controlling the movement of CVD reaction byproduct gases to adjacent process chambers": This patent showcases Hillman's expertise in creating regulated flows of purge gas to prevent the migration of CVD reaction by-product gases during substrate transfer.

- [object Object] - A method for pre-treating wafer substrates with exposed metal surfaces to reduce oxidation during subsequent cleaning processes.

Career Highlights:

Joseph T Hillman has worked with renowned companies such as Tokyo Electron Limited and Materials Research Corporation, where his innovative spirit and technical acumen have been instrumental in driving advancements in CVD technologies. His extensive experience and deep understanding of semiconductor processes have positioned him as a key figure in the industry.

Collaborations:

Throughout his career, Joseph T Hillman has actively collaborated with industry experts such as Robert F Foster and Michael S Ameen. These collaborations have not only enriched his own research and development efforts but have also paved the way for breakthrough innovations in semiconductor manufacturing.

Conclusion:

In conclusion, Joseph T Hillman's pioneering work in the realm of CVD processes stands as a testament to his ingenuity and dedication to advancing technological solutions in semiconductor manufacturing. His patents and collaborations have shaped the industry landscape, making him a respected figure among peers and a driving force behind cutting-edge innovations in the field.

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