The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Jun. 30, 2004
Glenn Gale, Tokyo, JP;
Joseph T. Hillman, Scottsdale, AZ (US);
Gunilla Jacobson, Gilbert, AZ (US);
Bentley Palmer, Phoenix, AZ (US);
Glenn Gale, Tokyo, JP;
Joseph T. Hillman, Scottsdale, AZ (US);
Gunilla Jacobson, Gilbert, AZ (US);
Bentley Palmer, Phoenix, AZ (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and system for processing a substrate in a film removal system. The method includes providing the substrate in a substrate chamber of a film removal system, where the substrate has a micro-feature containing a dielectric film on a sidewall of the micro-feature and a photoresist film covering a portion the dielectric film, and performing a first film removal process using supercritical COprocessing to remove the portion of the dielectric film not covered by the photoresist film. Following the first film removal process, a second film removal process using supercritical COprocessing can be performed to remove the photoresist film. Alternately, wet processing can be used to perform one of the first film removal process or the second film removal process.