Glenn W Gale

Title: Glenn W. Gale: Innovator in Semiconductor Processing

Introduction

Glenn W. Gale is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 4 patents. His innovative methods have advanced the technology used in the fabrication of semiconductor devices.

Latest Patents

One of his latest patents is titled "Method and apparatus for pattern collapse free wet processing of semiconductor devices." This method addresses the challenges of processing wafers used in semiconductor fabrication. It involves forming high-aspect ratio features on the wafer, followed by wet processing and drying. During the drying phase, pattern collapse can occur, which can hinder further processing. Gale's method includes techniques to repair this pattern collapse, such as etching to break bonds formed during the collapse. Another significant patent is a "Processing apparatus" that details a method for wet etching stacked films. This process involves bringing a first process liquid into contact with the first film, determining its removal, and then switching to a second process liquid to etch the second film.

Career Highlights

Throughout his career, Glenn W. Gale has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited and Lam Research Corporation. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor processing.

Collaborations

Gale has collaborated with notable professionals in his field, including Joseph T. Hillman and Gunilla Jacobson. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a spirit of innovation.

Conclusion

Glenn W. Gale's contributions to semiconductor processing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor technologies.