The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2003
Filed:
Nov. 18, 1999
Joseph T. Hillman, Scottsdale, AZ (US);
Tugrul Yasar, Scottsdale, AZ (US);
Kenichi Kubo, Kofu, JP;
Vincent Vezin, Yamanashi, JP;
Hideaki Yamasaki, Nirasaki, JP;
Yasuhiko Kojima, Yamanashi, JP;
Yumiko Kawano, Kofu, JP;
Hideki Yoshikawa, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A CVD reactor is provided with a precursor delivery system that is integrally connected to the reactor chamber. Liquid precursor such as a copper or other metal-organic precursor is atomized at the entry of a high flow-conductance vaporizer, preferably with the assistance of an inert sweep gas. Liquid precursor is maintained, when in an unstable liquid state, at or below room temperature. In the vaporizer, heat is introduced to uniformly heat the atomized precursor. The vaporized precursor is passed into a diffuser which diffuses the vapor, either directly or through a showerhead, into the reaction chamber.