Yonkers, NY, United States of America

Walter H Class


Average Co-Inventor Count = 3.3

ph-index = 6

Forward Citations = 249(Granted Patents)


Company Filing History:


Years Active: 1980-1986

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6 patents (USPTO):Explore Patents

Title: Innovations of Walter H Class

Introduction

Walter H Class is a notable inventor based in Yonkers, NY (US), recognized for his contributions to the field of plasma processing equipment. He holds a total of six patents, showcasing his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is the "Shaped field magnetron electrode." This invention features a substrate support electrode designed for use in plasma processing equipment. It includes a book-shaped prismatic body that contains a magnet core with flange-like pole pieces at each end, providing a longitudinal magnetic field wrapped around the electrode body. An auxiliary field-shaping magnet is spaced from the substrate support face of the electrode body, which flattens the magnetic field adjacent to the electrode support surface. This design produces a thin plasma of substantially uniform thickness close to the electrode surface.

Another significant patent is the "Magnetron reactive bias sputtering method and apparatus." This invention significantly increases the film deposition rate of metallic compounds onto a substrate in a vacuum chamber by reactive sputtering or reactive ion plating. It involves a substrate support with spaced apart magnetic poles that create a magnetic field with lines of force extending across the substrate surface exposed to a metallic coating source. A reactive gas is introduced into the chamber, and a bias voltage is applied to the substrate support, creating a dense glow discharge of ionized reactive gas. This process enhances the chemical reaction rate at the substrate and results in a metallic compound coating with superior physical and chemical characteristics.

Career Highlights

Walter H Class has made significant strides in his career, particularly through his work at Materials Research Corporation. His innovative patents have contributed to advancements in plasma processing technology, making him a key figure in his field.

Collaborations

Throughout his career, Walter has collaborated with notable coworkers, including Steven D Hurwitt and Michael L Hill. These collaborations have likely fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Walter H Class is a distinguished inventor whose work has had a profound impact on plasma processing equipment. His innovative patents reflect his dedication to advancing technology in this field.

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