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Daejeon, South Korea

Dnf Co., Ltd.

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USPTO Granted Patents = 29

Forward Citations = 33

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70 inventors (with patents filed for the assignee):

Sang Ick Lee (22 out of 32 patents)

Myong Woon Kim (19 out of 19 patents)

Se Jin Jang (14 out of 15 patents)

4. Sung Gi Kim (14 out of 29 patents)

5. Byeong-il Yang (11 out of 11 patents)

6. Joong Jin Park (10 out of 10 patents)

7. Sang-Do Lee (10 out of 10 patents)

8. Jeong Joo Park (9 out of 9 patents)

9. Sam Dong Lee (8 out of 8 patents)

10. Sang Yong Jeon (8 out of 8 patents)

11. Jang Hyeon Seok (5 out of 5 patents)

12. Jae-Soon Lim (4 out of 32 patents)

13. Youn-Joung Cho (4 out of 31 patents)

14. Myong-Woon Kim (4 out of 6 patents)

15. Sang-Ick Lee (4 out of 5 patents)

Core Competencies:

Silicon Thin Film

Indium Compound

Antimony Thin Film

Atomic Layer Etching

Metal Precursors

Dielectric Layer

Organometallic Compounds

Integrated Circuit

Low-k Dielectric

Transition Metal

Silylcyclodisilazane

Ruthenium Thin Film

29 patents: Sort by Forward Citations

1. 12518963 - Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the same (2026-01-06),

2. 12473647 - Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the same (2025-11-18),

3. 12459959 - Indium compound, method of producing the same, composition for depositing indium-containing thin film, and indium-containing thin film (2025-11-04),

4. 12398459 - Silicon metal oxide encapsulation film comprising metal or metal oxide in thin film, and manufacturing method therefor (2025-08-26),

5. 12384805 - Iodine-containing metal compound and composition for depositing thin film including the same (2025-08-12),

6. 12304924 - Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the same (2025-05-20),

7. 11901191 - Atomic layer etching method and semiconductor device manufacturing method using the same (2024-02-13),

8. 11827650 - Method of manufacturing ruthenium-containing thin film and ruthenium-containing thin film manufactured therefrom (2023-11-28),

9. 11749522 - Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the same (2023-09-05),

10. 11459653 - Method for manufacturing molybdenum-containing thin film and molybdenum-containing thin film manufactured thereby (2022-10-04),

11. 11447859 - Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the same (2022-09-20),

12. 11393676 - Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same (2022-07-19),

13. 11390635 - Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the same (2022-07-19),

14. 11358974 - Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition (2022-06-14),

15. 11319333 - Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the same (2022-05-03),

Company Overview

Dnf Co., Ltd. is a technology-driven company based in Daejeon, South Korea, specializing in advanced materials and innovative solutions. The organization focuses on the development and manufacturing of high-performance products for various industries, including electronics, automotive, and telecommunications. With a commitment to research and development, Dnf Co., Ltd. aims to enhance product efficiency and sustainability, positioning itself as a key player in the competitive landscape of technology and materials science.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Nov 3 2026

29 Patents

#31 in Daejeon

#467 in South Korea

#22,595 in the World

Daejeon, South Korea

Dnf Co., Ltd.

Forward Citations = 33

70 inventors:

Sang Ick Lee (22 out of 32 patents)

Myong Woon Kim (19 out of 19 patents)

Se Jin Jang (14 out of 15 patents)

4. Sung Gi Kim (14 out of 29 patents)

5. Byeong-il Yang (11 out of 11 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Dnf Co., Ltd.. Retrieved from https://idiyas.com/company/dnf-company

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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