The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 20, 2022

Filed:

Apr. 26, 2018
Applicant:

Dnf Co., Ltd., Daejeon, KR;

Inventors:

Myong Woon Kim, Daejeon, KR;

Sang Ick Lee, Daejeon, KR;

Sang Jun Yim, Cheongju-si, KR;

Won Mook Chae, Daejeon, KR;

Jeong Hyeon Park, Daejeon, KR;

Kang Yong Lee, Sejong, KR;

A Ra Cho, Daejeon, KR;

Joong Jin Park, Daejeon, KR;

Heang Don Lim, Daejeon, KR;

Assignee:

DNF CO., LTD., Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C07F 5/00 (2006.01); C07F 7/00 (2006.01); C07F 7/28 (2006.01); C07F 9/00 (2006.01); C07F 11/00 (2006.01); C23C 16/04 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
C23C 16/34 (2013.01); C07F 5/003 (2013.01); C07F 7/003 (2013.01); C07F 7/28 (2013.01); C07F 9/005 (2013.01); C07F 11/00 (2013.01); C07F 11/005 (2013.01); C23C 16/045 (2013.01); C23C 16/405 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01); C23C 16/50 (2013.01);
Abstract

Provided are a novel metal triamine compound, a method for preparing the same, a composition for depositing a metal-containing thin film including the same, and a method for preparing a metal-containing thin film using the same. The metal triamine compound of the present invention has excellent reactivity, is thermally stable, has high volatility, and has high storage stability, and thus, it may be used as a metal-containing precursor to easily prepare a high-purity metal-containing thin film having high density.


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