Daejeon, South Korea

Sang Ick Lee

This inventor holds 32 USPTO granted patents and 10 published patent applications and 4 EPO patents, primarily in Thin Film Technology. Top assignees: Dnf Co., Ltd., Sk Innovation Co., Ltd., Sabic Sk Nexlene Company Pte. Ltd.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sang Ick Lee. Retrieved from https://idiyas.com/inventor/sang-ick-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 32 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.5

ph-index = 3

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2014-2026

Loading Chart...
Loading Chart...
Areas of Expertise:
Silicon Thin Film
Lithium Battery Separator
Transition Metal Compound
Oligomerization Catalyst
Dielectric Layer
Metal-Oxide Encapsulation
Silylcyclodisilazane
Cyclopenta[b]fluorenyl
Amino-Silyl Amine
Ruthenium Thin Film
Molybdenum Thin Film
Negative Electrode Material
32 patents (USPTO):Explore Patents

Title: **Innovative Contributions of Sang Ick Lee in Thin Film Technology**

Introduction

Sang Ick Lee, based in Daejeon, South Korea, is a prominent inventor with an impressive portfolio of 26 patents. His work primarily revolves around advancements in thin film technology, where he has significantly contributed to the methodologies involved in the manufacturing of various thin films.

Latest Patents

Among his latest patents, the first is a **Method of manufacturing a ruthenium-containing thin film and ruthenium-containing thin film manufactured therefrom**. This invention provides a straightforward method that utilizes a ruthenium(0)-based hydrocarbon compound along with a specific reaction gas. This innovative approach ensures the production of high-purity thin films with ease.

The second patent focuses on a **Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the same**. This invention describes a novel composition for depositing thin films, featuring a bis(aminosilyl)alkylamine compound that acts as an effective precursor, facilitating the manufacturing of high-quality silicon-containing thin films.

Career Highlights

Sang Ick Lee has had a noteworthy career, having worked with reputable companies such as DNF Co., Ltd. and SK Innovation Co., Ltd. His contributions at these firms have led to significant advancements and innovations in the field of thin film technology.

Collaborations

Throughout his career, Sang Ick Lee has collaborated with talented individuals, including Myong Woon Kim and Se Jin Jang. These collaborations have not only enriched his work but have also led to a pooling of innovative ideas and techniques in the development of groundbreaking technologies.

Conclusion

Sang Ick Lee's contributions to the field of thin film technology exemplify his innovative spirit and commitment to advancing manufacturing processes. His extensive patent portfolio underscores the impact of his work, positioning him as a key figure in the realm of modern inventors.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…