The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2025

Filed:

Mar. 06, 2020
Applicant:

Dnf Co., Ltd., Daejeon, KR;

Inventors:

Myoung Woon Kim, Daejeon, KR;

Sang Ick Lee, Daejeon, KR;

Se Jin Jang, Jeju-do, KR;

Sung Gi Kim, Daejeon, KR;

Jeong Joo Park, Sejong si, KR;

Won Mook Chae, Daejeon, KR;

A Ra Cho, Daejeon, KR;

Byeong Il Yang, Daejeon, KR;

Joong Jin Park, Daejeon, KR;

Gun Joo Park, Daejeon, KR;

Sam Dong Lee, Daejeon, KR;

Haeng Don Lim, Daejeon, KR;

Sang Yong Jeon, Sejong si, KR;

Assignee:

DNF CO., LTD, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); H10K 59/80 (2023.01); H10K 102/00 (2023.01);
U.S. Cl.
CPC ...
C23C 16/401 (2013.01); C23C 16/45531 (2013.01); C23C 16/45542 (2013.01); H10K 59/873 (2023.02); H10K 2102/311 (2023.02);
Abstract

The present invention relates to a silicon oxide encapsulation film comprising a metal or a metal oxide, and a manufacturing method therefor. The silicon metal oxide encapsulation film according to the present invention has a high thin film growth rate and low moisture and oxygen permeabilities, thereby exhibiting a very excellent sealing effect even at a low thickness, and the stress strength and refractive index thereof can be controlled, thereby enabling a high-quality silicon metal oxide encapsulation film that is applicable to a flexible display to be readily manufactured.


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