Byeong Il Yang

Title: Byeong Il Yang: Innovator in Silicon Metal Oxide Technologies

Introduction

Byeong Il Yang is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of materials science, particularly in the development of advanced encapsulation films and etching methods. With a total of 4 patents to his name, Yang's work is paving the way for innovations in flexible display technologies.

Latest Patents

Yang's latest patents include a silicon metal oxide encapsulation film comprising a metal or metal oxide, along with a manufacturing method for this film. This invention focuses on creating a silicon oxide encapsulation film that exhibits a high thin film growth rate and low moisture and oxygen permeabilities. As a result, it provides an excellent sealing effect even at low thicknesses. The stress strength and refractive index of the film can be controlled, enabling the production of high-quality silicon metal oxide encapsulation films suitable for flexible displays.

Another notable patent is an atomic layer etching method that utilizes a ligand exchange reaction. This method involves several steps, including the provision of a substrate with a thin film, the formation of a halogenated thin film, and the etching of this film using a ligand without metal or metal precursors. This innovative approach enhances the precision and efficiency of the etching process.

Career Highlights

Throughout his career, Byeong Il Yang has worked with notable companies such as DNF Co., Ltd. and SK Hynix Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge research and development in the field of materials science.

Collaborations

Yang has collaborated with talented individuals in his field, including Se Jin Jang and Sung Gi Kim. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Byeong Il Yang is a distinguished inventor whose work in silicon metal oxide technologies is making a significant impact on the industry. His innovative patents and collaborations highlight his commitment to advancing materials science and technology.