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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11358974 B1

PDFFull Text
Date of Patent:
Jun. 14, 2022

Filed:

Mar. 28, 2018

Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition

Applicant:

Dnf Co., Ltd., Daejeon, KR;

Inventors:

Sung Gi Kim, Daejeon, KR;

Jeong Joo Park, Daejeon, KR;

Joong Jin Park, Daejeon, KR;

Se Jin Jang, Jeju-si, KR;

Byeong-il Yang, Daejeon, KR;

Sang-Do Lee, Daejeon, KR;

Sam Dong Lee, Daejeon, KR;

Sang Ick Lee, Daejeon, KR;

Myong Woon Kim, Daejeon, KR;

Assignee:

DNF CO., LTD., Daejeon, KR;

Attorney:

McCoy Russell LLP

Primary Examiner:

Marc S Zimmer

Int. Cl.
CPC ...
C07F 7/02 (2006.01); C23C 16/30 (2006.01); C23C 16/34 (2006.01); H01L 21/02 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01); C23C 16/32 (2006.01); C23C 16/36 (2006.01); C23C 16/40 (2006.01); C07F 7/10 (2006.01); C08G 77/62 (2006.01); C08L 83/14 (2006.01);
U.S. Cl.
CPC ...
C07F 7/025 (2013.01); C07F 7/10 (2013.01); C08G 77/62 (2013.01); C08L 83/14 (2013.01); C23C 16/308 (2013.01); C23C 16/325 (2013.01); C23C 16/345 (2013.01); C23C 16/36 (2013.01); C23C 16/401 (2013.01); C23C 16/45536 (2013.01); C23C 16/50 (2013.01); H01L 21/0214 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02126 (2013.01); H01L 21/02164 (2013.01); H01L 21/02167 (2013.01); H01L 21/02208 (2013.01); H01L 21/02219 (2013.01); H01L 21/02271 (2013.01); H01L 21/02274 (2013.01); C08L 2203/16 (2013.01); C08L 2203/20 (2013.01);
Abstract

Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.

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